99.9% high purity boron carbide for b4c sputtering target

99.9% High Purity Boron Nitride For Bn Sputtering Target 99.9% high purity boron carbide for b4c sputtering target

Product Description 99.9% High Purity Boron Nitride for BN Sputtering Target Boron nitride is a heat- and chemically resistant refractory compound of boron and nitrogen with the chemical formula BN. It exists in various crystalline forms that are isoelectronic to a similarly structured carbon lattice.99.9% High Purity Boron Nitride For Bn Sputtering Target 99.9% high purity boron carbide for b4c sputtering target99.9% High Purity Boron Nitride for BN Sputtering Target Boron nitride is a heat- and chemically resistant refractory compound of boron and nitrogen with the chemical formula BN. It exists in various crystalline forms that are isoelectronic to a similarly structured carbon lattice.

Boron Carbide (B4C) sputtering target,sputter target 99.9% high purity boron carbide for b4c sputtering target

Boron Carbide Sputtering targets - B4C . Purity---99.5% Shape--- Discs, Plate, Step ( Dia 480mm, Thickness 1mm) Rectangle, Sheet, Step ( Length410mm,Width 300mm, Thickness 1mm) Tube( Diameter< 300mm, Thickness >2mm, ) Application--- B4C in general are used for wear-resistant films and semi-conducting films.B4C are used as diffusion barriers in both silicon and III-V device 99.9% high purity boron carbide for b4c sputtering targetBoron Carbide Sputtering Targets (B4C) -AEM DepositionThe use of high density boron and boron carbide (B4C) and a vacuum-brazed target design was required to achieve the required sputter process stability and resistance to the thermal stress created by high rate sputtering. Boron Carbide Sputtering Target Information. Boron Carbide Sputtering Target Purity is 99.5%;Boron Carbide (B4C) Sputtering Targets | Carbide sputter 99.9% high purity boron carbide for b4c sputtering targetBoron Carbide (B4C) sputtering target specifications. Formula: B4C CAS No.: 12069-32-8. Max. dia. of flat sputter target: 8" Typical lead time of B4C sputtering target: 4 weeks. Regular Dimensions and Price of Boron Carbide (B4C) Sputtering Target

Boron Carbide (B4C) Sputtering Targets, indium, Purity: 99 99.9% high purity boron carbide for b4c sputtering target

Boron Carbide (B4C) Sputtering Targets, indium Purity: 99.5%, Size: 4'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.Boron Carbide (B4C) Micropowder, Microparticles, 1m, 99.9 99.9% high purity boron carbide for b4c sputtering targetALB Materials Inc supply Boron Carbide (B4C) Micropowder, Microparticles, 1m, 99.9% with high quality at competitive price.Boron Carbide BC Sputtering Target | AMERICAN ELEMENTSAmerican Elements specializes in producing high purity Boron Carbide (BC) Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Our standard Sputtering Targets for thin film are available monoblock or bonded with planar target 99.9% high purity boron carbide for b4c sputtering target

Boron Carbide Nanoparticles | AMERICAN ELEMENTS

Boron Carbide (BC) Nanoparticles, nanodots or nanopowder are spherical high surface area particles. Nanoscale Boron Carbide Particles are typically 10 - 100 nanometers (nm) with specific surface area (SSA) in the 10 - 75 m 2 /g range. Nano Boron Carbide Particles are also available in passivated and Ultra high purity and high purity and coated 99.9% high purity boron carbide for b4c sputtering targetBoron Carbide Nanopowder Detailed Analysis XRD SEM Boron carbide nanopowder possesses high purity, narrow range particle size distribution, larger specific surface area. The melting point of boron carbide nanopowder is up to 2350oC, boiling point higher than 3500 hardness up to 9.3, flexural strength 400Mpa. B 4 C nanoparticle does not react with acid and alkali solution. It has high 99.9% high purity boron carbide for b4c sputtering targetBoron Carbide Powder Best Quality Worldwide ShippingBoron carbide nanopowder possesses high purity, narrow range particle size distribution, larger specific surface area. The melting point of boron carbide nanopowder is up to 2350oC, boiling point higher than 3500 hardness up to 9.3, flexural strength 400Mpa. B4C nanoparticle does not react with acid and alkali solution.

Boron Carbide Powder, in

Nanoparticles Are Also Available in Passivated Ultra High Purity. Nanoparticles Used in Research Area of Strong Scientific Interest Due to The Variety of Application in Biomedical Electronic and Optical Boron Carbide Powder Have Widely Used in Research Area Due to Their Increased Reactivity as Compared with Conventional Nano/Micron Sized Particles. We Are Offering Them in Different Shape & Sizes.Boron carbide Manufacturers & Suppliers, China boron 99.9% high purity boron carbide for b4c sputtering target99.9% High Purity Boron Carbide for B4c Sputtering Target. 99.9% High Purity Boron Carbide for B4c Sputtering TargetBoron carbide Manufacturers & Suppliers, China boron 99.9% high purity boron carbide for b4c sputtering target99.9% High Purity Boron Carbide for B4c Sputtering Target. 99.9% High Purity Boron Carbide for B4c Sputtering Target

Boron (B) Sputtering Targets, Purity: 99.9%, Size: 3 99.9% high purity boron carbide for b4c sputtering target

Boron (B) Sputtering Targets Purity: 99.9%, Size: 3'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes. The process with sputter targets is repeatable and can be scaled up from small research and development projects. The proses with 99.9% high purity boron carbide for b4c sputtering targetBoron - B,sputtering target, powder, garnule,evaporation 99.9% high purity boron carbide for b4c sputtering targetBoron Sputtering Target ( B Target ) Purity--- 99.9%, 99.99% . Shape--- Discs, Plate, Step ( Dia 99.9% high purity boron carbide for b4c sputtering target ignitor in electronic industry, safety air cell initiator for automobile, synthesize all kinds of boron compounds with high purity, Smelting of 99.9% high purity boron carbide for b4c sputtering target Boron carbide sputtering target - B4C; Boron Nitride sputtering target - BN;Boron Oxide Sputtering Target | Boron Oxide Target | AEM Deposition is a senior manufacturer for Boron Oxide Sputtering Targets, we have rich experience to manufacture and sale high purity B2O3 Sputtering Targets.

Carbide Sputtering Targets | Metal Carbide Target 99.9% high purity boron carbide for b4c sputtering target

Our carbide sputtering targets include B4C, HfC, Mo2C, NbC, SiC, TaC, TiC, WC, VC, ZrC sputtering targets. AEM enjoys a very strong reputation by its excellent performance. We provides Each sputtering target ships complete with a Certificate of Analysis and SDS. In the following list, you can get all of Carbide Sputtering Targets.Carbide Nitride Sputter Target - QS Rare ElementsBoron Carbide (B4C) Sputtering Targets. Composition: Boron Carbide (B4C) Catalog No.: DPCB5ST Purity: 99.50% Please click for discount and other size Click here for the specifications of B4C sputter target Click here for the SDS document of B4C sputter targetSputtering Targets for Sale | Sputtering Target Supplier 99.9% high purity boron carbide for b4c sputtering targetAs a trusted sputtering target supplier, MSE Supplies can provide high-quality products with any chemical composition and size. Find customized sputtering targets for sale here. Best price guarantee.

Sputtering Targets | Vacuum Engineering and Materials Co

VEM, leading manufacturer of precious & non precious metal sputtering targets for over 30 years, provides a wide range of thin film deposition materials for your PVD thin film coating requirements. We provide Gold (Au), Platinum (Pt), Palladium (Pd), Silver (Ag), Iridium (Ir), Ruthenium (Ru), Rhodium (Rh), and Tantalum (Ta) targets and a variety of custom alloys and compositesputtering targets(metal target, alloy target,ceramic 99.9% high purity boron carbide for b4c sputtering targetCRM China, coating materials for the applications to magnetic disk and head, magneto optical disk, optical disk, superconducting thin film, protective film. Purity: 99%, 99.9%,99.95% 99.99%,99.995%A brief overview of RF sputtering deposition of boron 99.9% high purity boron carbide for b4c sputtering targetNov 30, 2018 · Studies of nuclear magnetic resonance (NMR) studied the crystal of stoichiometry close to B 12 C 3 and found that the central position in the CCC chain was partially filled by boron (60%) [].By using IR absorption spectroscopy, it has confirmed the presence of the CBC chain in compounds such as B 4 C [].Different techniques are used to prepare high-quality boron carbide; for 99.9% high purity boron carbide for b4c sputtering target

Abrasive high quality boron carbide ceramic tile materials 99.9% high purity boron carbide for b4c sputtering target

Abrasive high quality boron carbide ceramic tile materials b4c powder_OKCHEM Please note that all emails sent by OKCHEM are from ***@okchem 99.9% high purity boron carbide for b4c sputtering target, [email protected] okchemvip 99.9% high purity boron carbide for b4c sputtering target, or [email protected] 99.9% high purity boron carbide for b4c sputtering target.Abrasive high quality boron carbide ceramic tile materials 99.9% high purity boron carbide for b4c sputtering targetAbrasive high quality boron carbide ceramic tile materials b4c powder_OKCHEM Please note that all emails sent by OKCHEM are from ***@okchem 99.9% high purity boron carbide for b4c sputtering target, [email protected] okchemvip 99.9% high purity boron carbide for b4c sputtering target, or [email protected] 99.9% high purity boron carbide for b4c sputtering target.Bayville Chemical - Si/Al Rotatable Sputter TargetSilicon Aluminum Rotatable Sputter Targets. Si (90wt%) / Al (10wt%) 99.9% pure Rotatable magnetron sputter deposition has become the most widely used coating technology for large area deposition. The glass industry has introduced advanced coating technologies as the demand for value-added products for the glass industry continues to grow.

Boron Carbide Powder / B4C Powder (B4C, 1-3um, 99.9%) -

Boron Carbide Powder / B4C Powder (B4C, 1-3um, 99.9%) Boron carbide melting point up to 2350oC, boiling point higher than 3500oC, hardness up to 9.3, flexural strength 400Mpa; The product does not react with acid and alkali solution. It has high chemical potential and is one of the most stable materials to acid.Boron Carbide Sputtering Target (B4C, Purity: 99.99%) - Boron Carbide Sputtering Target (B4C, Purity: 99.99%) Product No. CAS: Purity: Thickness: Diameter: Shape: Appearance: Melting Point: NRE-43011: 12069-32-8 >99.9%Boron Carbide Sputtering Target | AMERICAN ELEMENTSAbout Boron Carbide Sputtering Target American Elements specializes in producing high purity Boron Carbide Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.

Boron Carbide Sputtering Targets (B4C) -AEM Deposition

The use of high density boron and boron carbide (B4C) and a vacuum-brazed target design was required to achieve the required sputter process stability and resistance to the thermal stress created by high rate sputtering. Boron Carbide Sputtering Target Information. Boron Carbide Sputtering Target Purity is 99.5%;China Metal Sputtering Target, Metal Sputtering Target 99.9% high purity boron carbide for b4c sputtering targetChina Metal Sputtering Target manufacturers - Select 2020 high quality Metal Sputtering Target products in best price from certified Chinese Tungsten manufacturers, Solar Energy System suppliers, wholesalers and factory on Made-in-China 99.9% high purity boron carbide for b4c sputtering target, page 6Fabrication of boron sputter targets (Patent) | DOE PatentsThe process involves the fabrication of a high density boron monolithe by hot isostatically compacting high purity (99.9%) boron powder, machining the boron monolithe into the final dimensions, and brazing the finished boron piece to a matching boron carbide (B.sub.4 C) piece, by placing aluminum foil there between and applying pressure and 99.9% high purity boron carbide for b4c sputtering target

Graphite/Carbide Products

Boron Carbide (B4C) Sputtering Targets. Composition: Boron Carbide (B4C) Catalog No.: DPCB5ST Purity: 99.50% Please click for discount and other size Click here for the specifications of B4C sputter target Click here for the SDS document of B4C sputter targetKurt J. Lesker Company | Boron Carbide B4C Sputtering 99.9% high purity boron carbide for b4c sputtering targetBoron Carbide B4C Sputtering Targets Shopping Cart 99.9% high purity boron carbide for b4c sputtering target Target Size Purity Bonding Type Backing Plate Size Compatible Guns Notes Part Number Price In Stock Add To Cart; Boron Carbide BORON CARBIDE TARGET, B4C, 99.5% PURE, 1.00" DIAMETER X 0.125" THICK, +/-0.010" ALL, INDIUM BONDED TO COPPER BACKING PLATE, OFHC 101, Cu, 1.00" DIAMETER X 0.125 99.9% high purity boron carbide for b4c sputtering targetMagnetron sputter deposition of boron and boron carbide 99.9% high purity boron carbide for b4c sputtering targetDec 10, 1991 · Boron film deposition rates of 0.2 nm s~ were achieved with these process parameters and a magnetron sputtering source with a target 6.35 cm in diameter. Boron carbide sputter targets were fabricated from fully dense, high purity (99.9%)

Tungsten Carbide (WC) Sputtering Target | High Purity 99.9% high purity boron carbide for b4c sputtering target

ST0221 Boron Carbide (B4C) Sputtering Target SPUTTERTARGETS Stanford Advanced Materials (SAM) Corporation is a global supplier of various sputtering targets such as metals, alloys, oxides, ceramic materials.boron target, boron target Suppliers and Manufacturers at 99.9% high purity boron carbide for b4c sputtering target99.9% High Pure B Boron Plate B Sputtering Target Boron is similar to carbon in its capability to form stable covalently bonded molecular networks. It is the best option so far for certain application, especially for bonding large scale target.buy Boron carbide Sputtering Target - FUNCMATERCharacteristic. Boron carbide (chemical formula approximately B 4 C) is an extremely hard boroncarbon ceramic and covalent material, as well as numerous industrial applications. With a Vickers Hardness of >30 GPa, it is one of the hardest known materials, behind cubic boron nitride and diamond.

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